LINCOTEC | Exhaust Gas Monitoring for Semiconductor Wafer Etching Equipment
LINCOTEC | Exhaust Gas Monitoring for Semiconductor Wafer Etching Equipment
Customer: LINCOTEC
Industry: Semiconductor
Application: Wafer Etching Equipment
Project Background: Process Exhaust Gas Monitoring
In semiconductor wafer etching processes, various process gases and by-products are generated, including corrosive gases such as silicon tetrafluoride (SiF₄). These gases must be effectively discharged and treated through an exhaust system to ensure safe operation of process equipment and maintain the stability of facility systems.
Customer Challenge:
During the etching process, the gases within the exhaust duct exhibit corrosive properties along with temperature variations. Without stable monitoring of exhaust airflow velocity and flow conditions, the efficiency of the exhaust system and the stability of process equipment may be affected. Therefore, the customer required a solution capable of continuously measuring airflow conditions within the exhaust duct.Implemented Product Type:
Air Velocity and Flow TransmitterResults:
By implementing an air velocity and flow transmitter to measure exhaust airflow, the customer can continuously monitor airflow conditions within the etching equipment’s exhaust ducts and integrate the measurement data into the facility monitoring system. With stable airflow measurement data, engineers can better understand the operating conditions of the exhaust system, enhancing the management and operational performance of both process equipment and exhaust systems.
Related Products
Sensor type : Pt20 / Pt300(Air velocity) / Pt1000(Temp.)
Measuring range : 0 ... 120 Nm/s
Output : 4 ... 20 mA / 0 ... 10 V / RS-485 / Impulse
Accuracy : 0 ... 40 m/s : ±(1% of mv+0.5 m/s), 40 ... 60 m/s : ±(1% of mv+1 m/s), 90 ... 120 m/s : ±(1% of mv+1.5 m/s)
IP rating : IP67(Probe) / IP65(Housing)
